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Terahertz Spectroscopic / Imaging Analysis System
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Electronic Measuring Instruments
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Products
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F5112 E-Beam Lithography System |
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Single-Column System Offers
an Economical Solution for 0.13-Micron
and Below Design Rules
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| The F5112 uses
an electron optical column equivalent
to the one adopted in Advantest's
previous F5121 twin-column system.
In addition to high current, this
column also incorporates a high-speed
e-beam deflection system. These
features combine with the F5112's
block exposure method-which significantly
decreases the number of necessary
exposure shots-to make it possible
to achieve high throughput on
a single-column system. Furthermore,
to ensure high reliability and
utilization, the F5112 offers
a monitoring/feedback system for
the exposure sequence and uses
in situ cleaning of the electron
optical column to maintain the
stability of the e-beam. |
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Perfect for ASIC engineering
samples, ASIC customer samples, and ASIC wiring.
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Inherits the high precision
and accuracy offered by the F5121.
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Superior tool for R&D
applications.
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F5112 |
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Minimum Feature
Size: |
100nm |
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CD Variation:
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3 sigma<=15nm |
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Overlay Accuracy: |
|mean|+3
sigma<=40nm |
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Exposure Method: |
Block exposure |
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Max. No. of Block
Patterns: |
70 |
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